SUBSTRATE PROCESSING APPARATUS

To provide a substrate processing apparatus that suppresses pattern cleaning phenomenon and watermark occurrence while maintaining the mass productivity of the batch processing method.SOLUTION: A substrate processing apparatus 300 includes a processing tank 310 having a housing space 312 in which a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHANG KYU HWAN, CHOI JUN YOUNG, LEE YOUNG IL, KIM CHUL-GOO, CHOI JUNG-BONG
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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