CLEANING BRUSH, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
To provide a technique for suppressing a cleaning brush from hindering discharge of cleaning liquid.SOLUTION: A cleaning brush cleans a chucking surface of a chuck. The cleaning brush includes a brush base linearly extending radially to the outside in a radial direction from a rotation center line o...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a technique for suppressing a cleaning brush from hindering discharge of cleaning liquid.SOLUTION: A cleaning brush cleans a chucking surface of a chuck. The cleaning brush includes a brush base linearly extending radially to the outside in a radial direction from a rotation center line of the chuck, and a plurality of contact portions which protrudes from the brush base and contacts the suction surface. When viewed in a direction orthogonal to the suction surface, a plurality of rows each including the plurality of contact portions arranged at intervals in the first direction, is provided at intervals in a second direction intersecting the first direction. The second direction is a longitudinal direction of the brush base. The first direction is a direction that obliquely intersects the second direction, and is a direction that inclines outward in the radial direction from a radially inner side of the chuck as the same goes from the upstream side in the rotational direction of the chuck to the downstream side in the rotational direction.SELECTED DRAWING: Figure 3
【課題】洗浄ブラシが洗浄液の排出を妨げるのを抑制する、技術を提供する。【解決手段】洗浄ブラシは、チャックの吸着面を洗浄する。前記洗浄ブラシは、前記チャックの回転中心線から径方向外側に直線状に延びるブラシ台と、前記ブラシ台から突出し、前記吸着面に接触する複数の接触部と、を備える。前記吸着面に直交する方向から見たときに、第1方向に間隔をおいて並ぶ複数の前記接触部からなる列が、前記第1方向に交わる第2方向に間隔をおいて複数設けられる。前記第2方向は前記ブラシ台の長手方向である。前記第1方向は、前記第2方向に斜めに交わる方向であって、前記チャックの回転方向上流側から回転方向下流側に向かうほど前記チャックの径方向内側から径方向外側に傾斜する方向である。【選択図】図3 |
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