ETCHING APPARATUS AND METHOD OF CONTROLLING THE SAME
To provide an etching apparatus capable of preventing damage to a bellows in an etchant pump configured to transfer an etchant from an etchant supply part to an etching chamber of the etching apparatus, and a method of controlling the same.SOLUTION: The present invention relates to an etching appara...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide an etching apparatus capable of preventing damage to a bellows in an etchant pump configured to transfer an etchant from an etchant supply part to an etching chamber of the etching apparatus, and a method of controlling the same.SOLUTION: The present invention relates to an etching apparatus including: an etching chamber in which a target object is etched by an etchant; an etchant supply part which collects the etchant in the etching chamber and supplies the etchant to the etching chamber using an etchant pump; a first pressure adjusting unit which injects a gas into the etchant pump to apply an operation pressure; a second pressure adjusting unit which pressurizes the etching chamber and the etchant supply part at the same predetermined pressure; a back pressure adjusting unit which adjusts a pressure of the gas discharged when the etchant pump operates; and a valve which controls an order and a direction in which the gas is injected into or discharged from the etchant pump.SELECTED DRAWING: Figure 1
【課題】食刻装置の食刻液供給部から食刻液を食刻チャンバーに移送させる食刻液ポンプ内部のベローズの損傷を防止できるようにする、食刻装置およびその制御方法を提供する。【解決手段】本発明は食刻装置に関し、食刻液によって対象体を食刻する食刻チャンバー;前記食刻チャンバー内の食刻液を回収し、食刻液ポンプによって前記食刻チャンバーに食刻液を供給する食刻液供給部;前記食刻液ポンプに気体を注入して駆動圧力を印加する第1圧力調節部;前記食刻チャンバーと前記食刻液供給部とを指定された同一の圧力で加圧させる第2圧力調節部;前記食刻液ポンプの駆動時に排出される気体の圧力を調節する排圧調節部および前記食刻液ポンプに前記気体が注入または排出される順序および方向を制御するバルブを含む。【選択図】図1 |
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