TRANSFER MECHANISM

To provide a transfer mechanism that prevent mist from being attached to a lid and being laminated in a structure that the lid for closing an opening of a cleaning mechanism is provided to the transfer mechanism.SOLUTION: A transfer mechanism (a second transfer mechanism 50) is provided to a process...

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Bibliographische Detailangaben
Hauptverfasser: PE CHEN CAI, MANIKANTAN NAIR PRAMOD
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a transfer mechanism that prevent mist from being attached to a lid and being laminated in a structure that the lid for closing an opening of a cleaning mechanism is provided to the transfer mechanism.SOLUTION: A transfer mechanism (a second transfer mechanism 50) is provided to a processing device having: a holding table that holds workpiece; a processing unit (a first cutting unit and a second cutting unit) that processes the workpiece held by the holding table; a cleaning mechanism 60 that cleans the workpiece to which the processing is applied by the processing unit. The transfer mechanism (the second transfer mechanism 50) transfers the workpiece from the holding table to the cleaning mechanism 60, and comprises: a holding mechanism that holds the workpiece; a cover part 54a that covers an opening 61a of a housing 61 of the cleaning mechanism; a movement unit that integrally moves the holding mechanism and the cover part 54a to the cleaning mechanism 60; and an air injection mechanism 51 that prevents liquid from being adhered onto the cover part 54a by injecting air toward the cover part 54a.SELECTED DRAWING: Figure 6 【課題】洗浄機構の開口を閉じる蓋を搬送機構に設ける構成において、蓋へのミストの付着、堆積を防止する搬送機構を提供する。【解決手段】ワークを保持する保持テーブルと、該保持テーブルで保持されたワークを加工する加工ユニット(第一切削ユニット、第二切削ユニット)と、該加工ユニットで加工が施された該ワークを洗浄する洗浄機構60と、を備えた加工装置に設けられる搬送機構(第二搬送機構50)であって、搬送機構(第二搬送機構50)は、保持テーブルから洗浄機構60へとワークを搬送するものであり、ワークを保持する保持機構と、洗浄機構の筐体61の開口61aを覆うカバー部54aと、保持機構とカバー部54aとを一体的に洗浄機構60に対して移動させる移動ユニットと、カバー部54aに向かって気体を噴射してカバー部54aに液体が付着するのを防止する気体噴射機構51と、を備える。【選択図】図6