COATING DEVICE AND COATING METHOD

To provide a coating device for forming coated films onto both surfaces of a base material which suppresses coating omission in a base material opening.SOLUTION: A coating device 20 includes first and second blocks 21 and 22 which coat a coating liquid C to both surfaces of a base material 2 and are opposite to each other in a thickness direction of the base material 2, and a liquid reservoir part 23 which is formed so as to accumulate the coating liquid C in a gap between the first and second blocks 21 and 22 and passes the base material 2 therethrough. The liquid reservoir part 23 includes a base material introduction port 24 that is opened to the upstream side in a conveyance direction of the base material 2 and to which the base material 2 is introduced, a base material discharge port 25 that is opened to the downstream side in the conveyance direction and to which the base material 2 is discharged, and side face parts 26 positioned on both sides in a width direction perpendicular to the conveyance direction. In the base material 2, a slit 3 is provided. In the liquid reservoir part 23, a columnar push-in member 36 having a central axis O extending in the width direction is arranged at least on one side in the thickness direction of the base material 2 passing through the liquid reservoir part 23. The push-in member 36 faces the slit 3 of the base material 2, and pushes-in the coating liquid C to the slit 3.SELECTED DRAWING: Figure 2 【課題】基材の両面に塗膜を形成する塗工装置にて基材開口部への塗布抜けを抑制する。【解決手段】塗工装置２０は、基材２の両面に塗液Ｃを塗布し、基材２の厚み方向に互いに対向する第１及び第２ブロック２１，２２と、第１及び第２ブロック２１，２２同士の隙間に塗液Ｃが溜まるように形成されるとともに基材２が通る液溜り部２３と、を備える。液溜り部２３は、基材２の搬送方向における上流側に開口し、基材２が導入される基材導入口２４と、搬送方向における下流側に開口し、基材２が排出される基材排出口２５と、搬送方向に直交する幅方向の両側に位置する側面部２６と、を含む。基材２には、スリット３が設けられている。液溜り部２３には、液溜り部２３を通過する基材２の少なくとも厚み方向一方側に、幅方向に延びる中心軸Ｏを有する円柱状の押込部材３６が配置されている。押込部材３６は、基材２のスリット３に臨んで塗液Ｃをスリット３に押し込む。【選択図】図２