WIRING BOARD, METHOD FOR MANUFACTURING THE SAME, AND SURFACE TREATMENT AGENT

To provide a wiring board in which a metal layer has high adhesibility to a substrate, a method for manufacturing such a wiring board, and a surface treatment agent available for manufacturing such a wiring board, etc.SOLUTION: A wiring board is provided, comprising a substrate, a metal particle lay...

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Bibliographische Detailangaben
Hauptverfasser: UCHIYAMA KATSUHIRO, SHIHO KOUJI, MITSUDA KAZUHIRO, YASU KATSUHIKO
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a wiring board in which a metal layer has high adhesibility to a substrate, a method for manufacturing such a wiring board, and a surface treatment agent available for manufacturing such a wiring board, etc.SOLUTION: A wiring board is provided, comprising a substrate, a metal particle layer and a metal plating layer, in this order. A compound α is interposed at least between the substrate and the metal particle layer or between the metal particle layer and the metal plating layer. The compound α is at least one of a compound α1 having in one molecule a benzene ring, alkoxy silyl group and at least one selected from among an azide group, an azide sulfonyl group and a diazo methyl group and a compound α2 obtained by applying hydrolyzable condensation to a hydrolyzable silane compound including the compound α1.SELECTED DRAWING: Figure 1 【課題】金属層の密着性が高い配線基板、このような配線基板の製造方法、及びこのような配線基板等の製造に用いることができる表面処理剤を提供する。【解決手段】本発明の一形態は、基材と、金属粒子層と、金属めっき層とをこの順に備え、上記基材と上記金属粒子層との間、及び上記金属粒子層と上記金属めっき層との間の少なくとも一方には化合物αが介在し、上記化合物αが、一分子内に、ベンゼン環と、アルコキシシリル基と、アジド基、アジドスルホニル基及びジアゾメチル基からなる群より選ばれる少なくとも1種の基とを有する化合物α1、及び上記化合物α1を含む加水分解性シラン化合物を加水分解縮合して得られる化合物α2の少なくとも一方である、配線基板である。【選択図】図1