X-RAY DIFFRACTION MEASUREMENT SYSTEM

To provide an X-ray diffraction measurement system that captures an image of a diffraction ring while performing planar oscillation, the system capable of control for constantly keeping a distance between an irradiation point and an imaging surface at a set value during planar oscillation even if th...

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1. Verfasser: MARUYAMA YOICHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide an X-ray diffraction measurement system that captures an image of a diffraction ring while performing planar oscillation, the system capable of control for constantly keeping a distance between an irradiation point and an imaging surface at a set value during planar oscillation even if the distance between the irradiation point and the imaging surface is set to any value.SOLUTION: In an X-ray diffraction measurement device 1, a laser emitter 40 that emits parallel visible light having an optical axis equal to an optical axis of an emitted X-ray includes a half-mirror that transmits the emitted X-ray and reflects the visible light so as to simultaneously emit the emitted X-ray and the visible light. A position control device 5 that moves the X-ray diffraction measurement device 1 in an optical axis direction of the emitted X-ray is included, and controls the X-ray diffraction measurement device 1 to move in the optical axis direction of the emitted X-ray so that an irradiation point of the visible light in an image captured by a camera CA is at a position corresponding to a distance between an irradiation point and an imaging surface, which is arbitrarily set, during planar oscillation.SELECTED DRAWING: Figure 2 【課題】 平面揺動を行いながら回折環を撮像するX線回折測定システムにおいて、照射点-撮像面間距離を任意の値に設定しても、平面揺動の際、照射点-撮像面間距離を常に設定値通りにする制御が可能なX線回折測定システムを提供する。【解決手段】X線回折測定装置1は、出射X線の光軸と等しい光軸の平行な可視光を出射するレーザ出射器40に、出射X線を通過させ可視光を反射させるハーフミラーを備え、出射X線と可視光を同時に出射できるようにされている。X線回折測定装置1を出射X線の光軸方向に移動させる位置制御装置5を備え、平面揺動の際、カメラCAでの撮影画像における可視光の照射点が、任意に設定された照射点-撮像面間距離に対応する位置になるよう、X線回折測定装置1を出射X線の光軸方向に移動させる制御を行う。【選択図】図2