CRYSTALLIZATION METHOD, CRYSTALLIZATION DEVICE AND CRYSTALLIZATION SYSTEM
To provide a crystallization method, a crystallization device and a crystallization system that can set a reaction start point on a surface of a liquid film formed at an inner periphery of a stirring blade having highest shearing force without requiring high manufacturing accuracy.SOLUTION: A crysta...
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Zusammenfassung: | To provide a crystallization method, a crystallization device and a crystallization system that can set a reaction start point on a surface of a liquid film formed at an inner periphery of a stirring blade having highest shearing force without requiring high manufacturing accuracy.SOLUTION: A crystallization device 4 comprises: a reaction tank 1 of a bottomed cylinder shape which has an inner peripheral surface 1i; a cylindrical stirring blade W which is arranged inside the reaction tank 1 rotatably and concentrically with the reaction tank 1, and also has a plurality of holes h penetrating radially; a first liquid feed part 5a which is provided to the reaction tank 1, and supplies a first reaction liquid L1 into the reaction tank 1 to form a liquid film of the first reaction liquid L1 on the inner peripheral surface 1i of the reaction tank 1 as the stirring blade W rotates; and a second liquid feed part N which supplies a second reaction liquid L2 toward the liquid film of the first reaction liquid L1 from a position located away from the inner peripheral surface 2i of the stirring blade W and the liquid film of the first reaction liquid L1 and different from the first liquid feed part 5a in the reaction tank 1 to cause the first reaction liquid L1 and second reaction liquid 2 to react with each other.SELECTED DRAWING: Figure 1
【課題】高い製作精度を要せず剪断力が最も高い撹拌翼の内周に形成される液膜の表面を反応開始ポイントとすることができる晶析方法、晶析装置、および晶析システムを提供する。【解決手段】内周面1iを有する有底円筒状の反応槽1と、反応槽1の内部に反応槽1と同心状かつ回転可能に配置されるとともに径方向に貫通する複数の孔hを備える円筒状の撹拌翼Wと、反応槽1に設けられるとともに反応槽1の内部に第1反応液L1を供給し、撹拌翼Wの回転に伴い反応槽1の内周面1iに第1反応液L1の液膜を形成する第1給液部5aと、撹拌翼Wの内周面2iと第1反応液L1の液膜とから離れた反応槽1の内部の第1給液部5aと異なる位置から第1反応液L1の液膜に向けて第2反応液L2を供給し第1反応液L1と第2反応液L2を反応させる第2給液部Nと、を備えることを特徴とする晶析装置4。【選択図】図1 |
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