ADHESIVE COMPOSITION, ADHESIVE FILM, AND METHOD FOR PRODUCING CONNECTION STRUCTURE

To provide an adhesive composition including a polyurethane amide imide resin having excellent MEK solubility and an adhesive film, and a method for producing a connection structure using the adhesive film.SOLUTION: An adhesive composition includes a polyurethane amide imide resin as a block copolym...

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Hauptverfasser: YOSHIBA AYUMI, IZAWA HIROYUKI, OKOSHI SHOJI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide an adhesive composition including a polyurethane amide imide resin having excellent MEK solubility and an adhesive film, and a method for producing a connection structure using the adhesive film.SOLUTION: An adhesive composition includes a polyurethane amide imide resin as a block copolymer comprising a polyurethane oligomer from the reaction between a diisocyanate and a diol, which is chain-extended with a trimellitic acid anhydride. Relative to 100 pts.mass of the polyurethane amide imide resin, the MEK is 1-1000 pts.mass.SELECTED DRAWING: None 【課題】MEK溶解性に優れたポリウレタンアミドイミド樹脂を含む接着剤組成物及び接着剤フィルム、並びに接着剤フィルムを用いる接続構造体の製造方法を提供する。【解決手段】接着剤組成物は、ジイソシアネートとジオールとの反応から得られたポリウレタンオリゴマを、トリメリット酸無水物で鎖延長したブロック共重合体であるポリウレタンアミドイミド樹脂を含み、前記接着剤組成物は、前記ポリウレタンアミドイミド樹脂100質量部に対して、MEKを1~1000質量部含有する。【選択図】なし