CONTROL DEVICE, PLATING SYSTEM AND CONTROL METHOD
To provide a plating system that is effective in compatibly suppressing a plating coating weight from being insufficient and saving a plating material.SOLUTION: A control device 100 comprises: a lower-limit control part 114 which increases a plating coating weight by gas wiping devices 10, 20 when a...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a plating system that is effective in compatibly suppressing a plating coating weight from being insufficient and saving a plating material.SOLUTION: A control device 100 comprises: a lower-limit control part 114 which increases a plating coating weight by gas wiping devices 10, 20 when a minimum value of the plating coating weight decreases below a predetermined lower-limit value at a plurality of measurement places of a steel strip 9 passed through a plating pot 2 and the gas wiping devices 10, 20, wherein the plating pot houses a plating bath containing molten zinc and the gas wiping devices blow a gas to the steel strip 9 passed through the plating pot 2; an upper-limit control part 115 which decreases the plating coating weight by the gas wiping devices 10, 20 when a maximum value of the plating coating weight increases above a predetermined upper-limit value at the plurality of measurement places; and a difference monitor part 116 which inhibits the decrease of the plating coating weight by the gas wiping devices 10, 20 when the difference between the maximum value and minimum value exceeds a difference threshold.SELECTED DRAWING: Figure 2
【課題】めっき付着量の不足抑制と、めっき材の節約との両立に有効なめっきシステムを提供する。【解決手段】制御装置100は、溶融亜鉛を含有するめっき浴を収容するめっきポット2と、めっきポット2を通過した鋼帯9にガスを吹き付けてめっき付着量を調節するガスワイピング装置10,20とを通過した鋼帯9の複数の測定箇所におけるめっき付着量の最小値が所定の下限値を下回った場合に、ガスワイピング装置10,20によりめっき付着量を上昇させる下限制御部114と、複数の測定箇所におけるめっき付着量の最大値が所定の上限値を上回っている場合に、ガスワイピング装置10,20によりめっき付着量を低下させる上限制御部115と、最大値と最小値との差分が差分閾値を上回っている場合に、ガスワイピング装置10,20によりめっき付着量を低下させることを禁止する差分監視部116と、を備える。【選択図】図2 |
---|