LAMINATED CURABLE RESIN STRUCTURE, DRY FILM, CURED PRODUCT AND ELECTRONIC COMPONENT

To provide a laminated curable resin structure from which a cured product that has high resolution and crack resistance and excellent adhesion to metal plating can be obtained.SOLUTION: A laminated curable resin structure is composed of two resin layers in which an X layer composed of an alkali-solu...

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Bibliographische Detailangaben
Hauptverfasser: UEDA CHIHO, SHIBATA DAISUKE, SHU SHOTARO, SHIMADA SAWAKO, KATO FUMITAKA
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a laminated curable resin structure from which a cured product that has high resolution and crack resistance and excellent adhesion to metal plating can be obtained.SOLUTION: A laminated curable resin structure is composed of two resin layers in which an X layer composed of an alkali-soluble resin composition X and a Y layer composed of an alkali-soluble resin composition Y are laminated, wherein the X layer is 5% or more and 30% or less of the thickness of the total two resin layers combined with the Y layer, and in a cured product with a thickness of 20 to 30 μm by light irradiation of 1,000 mJ/cm2 and heat treatment at 160°C for one hour, a coefficient of thermal expansion at 200 to 250°C by thermomechanical analysis is 110 ppm/°C or less.SELECTED DRAWING: Figure 1 【課題】高い解像性と、クラック耐性、金属めっきとの密着性に優れた硬化物を得ることができる積層硬化性樹脂構造体を提供する。【解決手段】アルカリ可溶性樹脂組成物XからなるX層と、アルカリ可溶性樹脂組成物YからなるY層とが積層された2層の樹脂層からなり、前記X層が、前記Y層と合わせた2層の樹脂層全体の厚さの5%以上30%以下であり、1000mJ/cm2の光照射および160℃、1時間の熱処理による厚さ20~30μmの硬化物において、熱機械分析による200~250℃の熱膨張係数が110ppm/℃以下である積層硬化性樹脂構造体。【選択図】図1