SUBSTRATE DRYING DEVICE AND SUBSTRATE PROCESSING DEVICE

To provide a substrate drying device and a substrate processing device that can reduce the occurrence of pattern clogging.SOLUTION: In a substrate processing device 1, a drying device (substrate drying device) 300 includes a heating portion 32 that heats a substrate W, a drying chamber 31 into which the substrate W having a liquid film of a processing liquid formed on the surface to be processed is carried, a support portion 34 that receives the substrate W carried into the drying chamber 31 at a standby position D that is separated from the heating portion 32, and a drive mechanism 35 that moves to a drying position U close to the heating portion 32 while rotating the substrate W supported by the support portion 34, and discharges the liquid film provided between the drive mechanism and the substrate W heated by the heating portion 32 and generating an air layer by the centrifugal force caused by the rotation of the substrate W.SELECTED DRAWING: Figure 2 【課題】パターン閉塞の発生を低減できる基板乾燥装置及び基板処理装置を提供する。【解決手段】基板処理装置１において、乾燥装置（基板乾燥装置）３００は、基板Ｗを加熱する加熱部３２と、被処理面上に処理液による液膜が形成された状態の基板Ｗが搬入される乾燥室３１と、乾燥室３１に搬入された基板Ｗを、加熱部３２から離隔した待機位置Ｄで受け取る支持部３４と、支持部３４に支持された基板Ｗを回転させながら、加熱部３２に接近する乾燥位置Ｕに移動させ、加熱部３２により加熱された基板Ｗとの間に気層が生じた液膜を、基板Ｗの回転による遠心力により排出させる駆動機構３５と、を有する。【選択図】図２