ADJUSTING METHOD FOR ELECTRON MICROSCOPE

To provide an adjusting method for an electron microscope capable of more clearly observing the microstructures of various materials.SOLUTION: An adjusting method for an electron microscope includes the steps of embedding two or more image preparation thin plates in a board and including them in the...

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1. Verfasser:	HOSONO URETAKE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ALLOYS BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY FERROUS OR NON-FERROUS ALLOYS INDUCTANCES MAGNETS METALLURGY SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES TRANSFORMERS TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Zusammenfassung:	To provide an adjusting method for an electron microscope capable of more clearly observing the microstructures of various materials.SOLUTION: An adjusting method for an electron microscope includes the steps of embedding two or more image preparation thin plates in a board and including them in the same field of view of the electron microscope, creating a first luminance histogram before adjustment, and adjusting the location of a luminance peak derived from each thin plate in the first luminance histogram before adjustment to a predetermined location and adjusting the difference between the luminance peak locations derived from each thin plate to a predetermined size.SELECTED DRAWING: Figure 5 【課題】各種材料の組織をより明確に観察できるようにするための電子顕微鏡の調整方法を提供する。【解決手段】２種類以上の画像調製用の薄板を基材に埋め込んで電子顕微鏡の同一視野内に含める工程と、調整前の第１輝度ヒストグラムを作成する工程と、調整前の第１輝度ヒストグラムにおける各薄板由来の輝度ピークの位置を所定の位置に調整し、かつ、各薄板由来の輝度ピーク位置の差を所定の大きさに調整する工程と、を有する電子顕微鏡の調整方法である。【選択図】図５