SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND PROGRAM

PURPOSE: To provide a technique with high process efficiency.SOLUTION: A technique of having the following is provided: a plurality of reactors that can perform a plurality of processes on a substrate, a conveyance chamber adjacent to the reactors, a conveyance robot provided in the conveyance chamb...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OHASHI TADASHI, KIKUCHI TOSHIYUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES
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