SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND PROGRAM

PURPOSE: To provide a technique with high process efficiency.SOLUTION: A technique of having the following is provided: a plurality of reactors that can perform a plurality of processes on a substrate, a conveyance chamber adjacent to the reactors, a conveyance robot provided in the conveyance chamber and being able to convey the substrate to the reactor, a storage unit that records the pieces of type information corresponding to the respective processes and pieces of process time information for the respective pieces of type information, a calculation unit that calculates a ratio of process times of predetermined processes among the times totaling the pieces of process time information, a process selection unit that selects the reactor to perform the predetermined process in accordance with the ratio, and a process setting unit that sets so as to enable the predetermined process in the selected reactor.SELECTED DRAWING: Figure 1 【目的】処理効率の高い技術を提供する。【解決手段】基板に対して複数種類の処理が可能なリアクタと、複数の前記リアクタに隣接する搬送室と、前記搬送室内に設けられ、それぞれの前記リアクタに基板を搬送可能な搬送ロボットと、それぞれの前記処理に対応した種別情報と、それぞれの前記種別情報に対応した処理時間情報とが記録される記憶部と、前記処理時間情報を合わせた時間のうち、所定の処理の処理時間の割合を算出する算出部と、前記割合に応じて、前記所定の処理を行うリアクタを選択する処理選択部と、選択された前記リアクタにて、前記所定の処理が可能なよう設定する処理設定部と、を有する技術が提供される。【選択図】図１