SPUTTERING TARGET, METHOD FOR MANUFACTURING THE SAME, AND OPTICAL FUNCTION FILM

To provide a sputtering target excellent in heat resistance and alkali resistance and capable of efficiently and stably depositing an optical function film capable of sufficiently suppressing light reflection from a metal thin film, etc.SOLUTION: A sputtering target includes a metal phase consisting...

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Bibliographische Detailangaben
Hauptverfasser:	OKANO SUSUMU, SUGIUCHI YUKIYA, OTOMO KENJI, UMEMOTO KEITA, KANEKO DAISUKE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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