SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

To perform batch type liquid processing while controlling the atmosphere around a substrate.SOLUTION: A substrate processing device includes a substrate holding unit that holds a plurality of substrates in a vertical posture that are arranged in a horizontal direction, a rotation driving unit that rotates the substrate holding unit, a processing container with a first opening through which the substrate holding unit can pass, a processing fluid supply mechanism that supplies at least processing liquid to the processing container, a first closing structure that closes the first opening of the processing container, and a moving mechanism that moves the substrate holding unit and the processing container relatively. When the substrate holding unit and the processing container are in a first positional relation, the processing container surrounds the periphery of the substrate holding unit; the first opening of the processing container is closed by the first closing structure; and a processing chamber that is closed is formed to be able to accumulate the processing liquid so that at least a lower part of each substrate held by the substrate holding unit is immersed. When the substrate holding unit and the processing container are in a second positional relation, the first closing structure opens the first opening and the substrate holding unit is exposed without being surrounded by the processing container.SELECTED DRAWING: Figure 6 【課題】基板周囲の雰囲気を制御しつつバッチ式液処理を行う。【解決手段】基板処理装置は、複数の基板を鉛直姿勢で水平方向に並べて保持する基板保持部と、基板保持部を回転させる回転駆動部と、基板保持部が通過可能な第１開口部を有する処理容器と、処理容器に少なくとも処理液を供給する処理流体供給機構と、処理容器の第１開口部を閉塞する第１閉塞構造物と、基板保持部と処理容器とを相対的に移動させる移動機構とを備える。基板保持部と処理容器とが第１位置関係にあるときに、処理容器が基板保持部の周囲を包囲し、処理容器の第１開口部が第１閉塞構造物により閉塞され、基板保持部に保持された各基板の少なくとも下部が浸漬されるように処理液を貯留し得る閉鎖された処理室が形成される。基板保持部と処理容器とが第２位置関係にあるときに、第１閉塞構造物が第１開口部を開放するとともに基板保持部が処理容器に包囲されずに露出する。【選択図】図６