SUBSTANCE INTRODUCTION DEVICE AND SUBSTANCE INTRODUCTION METHOD

To provide a substance introduction device and a substance introduction method that can achieve improved introduction efficiency or cytotoxicity by using physical introduction techniques.SOLUTION: A substance introduction device according to the present disclosure has a stress and charge application...

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1. Verfasser: HIGUCHI YOICHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a substance introduction device and a substance introduction method that can achieve improved introduction efficiency or cytotoxicity by using physical introduction techniques.SOLUTION: A substance introduction device according to the present disclosure has a stress and charge application unit that forms a channel to cause turbulence in a fluid, which contains a cell and a substance to be introduced into the cell, and applies charge to the channel. A substance introduction method according to the present disclosure includes a stress and charge application step in which: while flowing a fluid, which contains a cell and a substance to be introduced into the cell, to a channel that causes turbulence, charge is applied to the channel.SELECTED DRAWING: Figure 2 【課題】物理的な導入手法を用いて改善された導入効率又は細胞障害性を実現可能な物質導入装置及び物質導入方法を提供する。【解決手段】本開示に係る物質導入装置は、細胞と前記細胞に導入すべき物質とを含む流体に乱流を生じさせる流路を形成するとともに前記流路に電荷を印加する、応力・電荷印加部を有する、物質導入装置である。本開示に係る物質導入方法は、乱流を生じさせる流路に細胞と前記細胞に導入すべき物質とを含む流体を流しながら前記流路に電荷を印加する、応力・電荷印加ステップを有する、物質導入方法である。【選択図】図2