PHOTOSENSITIVE RESIN COMPOSITION

To provide a photosensitive resin composition which has low dielectric constant and dielectric loss and enables patterning by photolithography.SOLUTION: A photosensitive resin composition has: (A) a saturated hydrocarbon-based polymer structure having a molecular weight of 1000-100000; (B) at least...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IDE MASAHITO, MANABE TAKAO, INENARI HIROSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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