DEFECT INSPECTION METHOD

To provide a defect inspection method capable of reducing the ratio of nuisance to DOI.SOLUTION: The defect inspection method using a defect inspection device for acquiring an image of a first sample by irradiating the first sample with illumination light and comparing the image of the first sample...

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1. Verfasser: HIRANO RYOICHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a defect inspection method capable of reducing the ratio of nuisance to DOI.SOLUTION: The defect inspection method using a defect inspection device for acquiring an image of a first sample by irradiating the first sample with illumination light and comparing the image of the first sample with a reference image to inspect defects, includes the steps of: generating the reference image; acquiring the image of the first sample; setting defect detection conditions using an index based on results of defect inspection of a second sample, which is different from the first sample; and discriminating nuisance based on the defect detection conditions from the result of comparing the reference image with the image of the first sample.SELECTED DRAWING: Figure 2 【課題】DOIに対するニュイサンスの比率を低減できる欠陥検査方法を提供する。【解決手段】第1試料に照明光を照射して第1試料の画像を取得し、参照画像と第1試料の画像とを比較して欠陥を検査する欠陥検査装置を用いた欠陥検査方法であって、参照画像を生成する工程と、第1試料の画像を取得する工程と、第1試料とは異なる第2試料の欠陥検査の結果に基づく指標を用いて欠陥検出条件を設定する工程と、参照画像と第1試料の画像とを比較した結果から、欠陥検出条件に基づいてニュイサンスを判別する工程と、を備える欠陥検査方法。【選択図】図2