FLOW RATE MEASUREMENT METHOD AND SUBSTRATE PROCESSING DEVICE

To accurately measures the flow rate of gas after branching, which is shunted by a branch gas pipe and flows into a processing chamber.SOLUTION: A flow rate measuring method for measuring the flow rate of gas in a substrate processing device including a gas supply pipe that supplies gas, a plurality of branched gas pipes that are branched from the gas supply pipe, a metal window that communicates with the plurality of branched gas pipes, and a shower head located at the bottom of the metal window and having a gas discharge hole for passing the gas through the metal window includes a step of arranging a flow meter at a supply port of the metal window communicating with the plurality of the branched gas pipes and measuring the flow rate of gas flowing to the supply port of the metal window by the flow meter.SELECTED DRAWING: Figure 2 【課題】分岐ガス配管により分流され、処理室内に流れる分岐後のガスの流量を精度良く測定する。【解決手段】ガスを供給するガス供給配管と、前記ガス供給配管から分岐する複数の分岐ガス配管と、前記複数の分岐ガス配管に連通する金属窓と、前記金属窓の底部に配置され、前記金属窓から前記ガスを通すガス吐出孔を有するシャワーヘッドと、を有する基板処理装置においてガスの流量を測定する流量測定方法であって、複数の前記分岐ガス配管に連通する前記金属窓の供給口に流量計を配置し、前記流量計により前記金属窓の供給口に流れるガスの流量を測定する工程を有する、流量測定方法が提供される。【選択図】図２