SUBSTRATE PROCESSING LIQUID RECOVERY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
To provide a substrate processing liquid recovery unit having improved cleaning efficiency and a substrate processing apparatus including the same.SOLUTION: A substrate processing apparatus includes: a substrate support unit that supports a substrate; and a substrate processing liquid recovery unit...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a substrate processing liquid recovery unit having improved cleaning efficiency and a substrate processing apparatus including the same.SOLUTION: A substrate processing apparatus includes: a substrate support unit that supports a substrate; and a substrate processing liquid recovery unit that surrounds the substrate support unit, recovers a substrate processing liquid discharged to the substrate, and has a first recovery tank. The first recovery tank includes: a first base discharging the substrate processing liquid to the outside via a first recovery line, and including a third portion arranged on one side of the substrate support unit and a fourth portion arranged on the other side of the substrate support unit; a first side wall extending upward from one end of the first base; a first upper plate extending upwardly inclined from the end of the first side wall; and a first inner wall extending upward from the other end of the first base, the third and fourth portions having different heights.SELECTED DRAWING: Figure 1
【課題】洗浄効率が向上した基板処理液回収ユニットおよびそれを備える基板処理装置を提供する。【解決手段】基板処理装置は、基板を支持する基板支持ユニットと、基板支持ユニットを囲み、基板に吐出する基板処理液を回収し、第1回収槽を備える基板処理液回収ユニットを含み、第1回収槽は、第1回収ラインを介して基板処理液を外部に排出し、基板支持ユニットの一側に配置される第3部分および基板支持ユニットの他側に配置される第4部分を含む第1ベースと、第1ベースの一端部から上方に延びる第1側壁と、第1側壁の端部から上向き傾斜して延びる第1上板と、第1ベースの他端部から上方に延びる第1内壁を含み、第3部分および第4部分は高さが異なる。【選択図】図1 |
---|