STRUCTURE OF STERIC HINDRANCE ADJUSTABLE WEAK BASE PHOTOSTABILIZER AND ITS MANUFACTURING METHOD AND USE

STRUCTURE OF STERIC HINDRANCE ADJUSTABLE WEAK BASE PHOTOSTABILIZER AND ITS MANUFACTURING METHOD AND USE

To relate to a structure of a steric hindrance adjustable weak base photostabilizer and its manufacturing method and its use.SOLUTION: A photostabilizer adjusts its steric hindrance by setting a size of a substituent which causes a steric hindrance around a nitrogen atom for example in a following s...

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Hauptverfasser: WANG YIFEI, DING YIFAN, LUO RUI, SONG JINGE, LIU SHUBAI, YU MEIYA, WANG JIJIANG, CHEN XIUYING, LI JING, ZHAO CHENGSHI, YIN QIWEI, MAO LIJUAN, CHEN JUN, XU CHUNJUAN
Format: Patent
Sprache:eng ; jpn
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ACYCLIC OR CARBOCYCLIC COMPOUNDS
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
HETEROCYCLIC COMPOUNDS
METALLURGY
ORGANIC CHEMISTRY
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Zusammenfassung:To relate to a structure of a steric hindrance adjustable weak base photostabilizer and its manufacturing method and its use.SOLUTION: A photostabilizer adjusts its steric hindrance by setting a size of a substituent which causes a steric hindrance around a nitrogen atom for example in a following structural general formula. Also, by adjusting proximity of a polar group, electronegativity of the nitrogen atom can be affected and basicity or nucleophilicity can be adjusted. By adjusting the steric hindrance, nucleophilicity or basicity in an environment of nitrogen atoms, a desired effect is obtained, and a scope of the application of these photostabilizers can be extended and suitable for use as a photostable protective additive for PC, polyester, PVC, and other acidic or electrophilic polymeric materials.SELECTED DRAWING: None 【課題】立体障害調節可能な弱塩基光安定剤の構造及びその製造方法と使用に関するものである。【解決手段】光安定剤は、例えば下記の構造一般式において、窒素原子周辺の立体障害を生じる置換基の大きさを設定することで、その立体障害を調整している。また、極性基の近接性を調整することで、窒素原子の電気陰性度に影響を与え、その塩基性又は求核性を調整することができる。窒素原子の環境下での立体障害や求核性又は塩基性を調整することにより、所望の効果が得られるため、これらの光安定剤の適用範囲が広がり、ＰＣ、ポリエステル、ＰＶＣ、その他の酸性又は親電性高分子材料の光安定性保護添加剤としての使用に適している。JPEG2022077496000120.jpg22126【選択図】なし