WAFER WASHING WATER SUPPLY SYSTEM AND SUPPLY METHOD FOR WAFER WASHING WATER

To provide a wafer washing water supply system which reduces excessive water, reduces the risk of mixture of a dissolved gas and is capable of saving the space.SOLUTION: A wafer washing water supply system 1 comprises: a wafer washing water manufacturing unit 2 which manufactures wafer washing water...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SUGITA WATARU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMISTRY CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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