SILICA DISPERSION, AND POLISHING AGENT COMPOSITION
To provide an antibacterial agent-blended silica dispersion having an antibacterial properties, scarce in reduction of a polishing speed even when used as one constituent of a polishing agent composition, and good in surface conditions of a board after polishing.SOLUTION: The silica dispersion conta...
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| creator | HARAGUCHI TETSURO |
| description | To provide an antibacterial agent-blended silica dispersion having an antibacterial properties, scarce in reduction of a polishing speed even when used as one constituent of a polishing agent composition, and good in surface conditions of a board after polishing.SOLUTION: The silica dispersion contains colloidal silica, and an organic compound having a hemiformal structure. The organic compound having a hemiformal structure may be an aliphatic organic compound, an aromatic organic compound, or further a compound formed by combining an aliphatic organic compound with an aromatic organic compound.SELECTED DRAWING: None
【課題】抗菌性を有し、研磨剤組成物の一成分として使用する場合であっても、研磨速度の低下が僅かであり、研磨後の基板の表面状態が良好な抗菌剤を配合したシリカ分散液の提供を課題とする。【解決手段】シリカ分散液は、コロイダルシリカと、ヘミホルマール構造を有する有機化合物とを含有する。ヘミホルマール構造を有する有機化合物は、脂肪族有機化合物または芳香族有機化合物であってもよく、更に、脂肪族有機化合物と芳香族有機化合物とを組み合わせて形成されるものであっても構わない。【選択図】なし |
| format | Patent |
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【課題】抗菌性を有し、研磨剤組成物の一成分として使用する場合であっても、研磨速度の低下が僅かであり、研磨後の基板の表面状態が良好な抗菌剤を配合したシリカ分散液の提供を課題とする。【解決手段】シリカ分散液は、コロイダルシリカと、ヘミホルマール構造を有する有機化合物とを含有する。ヘミホルマール構造を有する有機化合物は、脂肪族有機化合物または芳香族有機化合物であってもよく、更に、脂肪族有機化合物と芳香族有機化合物とを組み合わせて形成されるものであっても構わない。【選択図】なし</description><language>eng ; jpn</language><subject>ADHESIVES ; CHEMISTRY ; COMPOUNDS THEREOF ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; INORGANIC CHEMISTRY ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-METALLIC ELEMENTS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220509&DB=EPODOC&CC=JP&NR=2022067800A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220509&DB=EPODOC&CC=JP&NR=2022067800A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HARAGUCHI TETSURO</creatorcontrib><title>SILICA DISPERSION, AND POLISHING AGENT COMPOSITION</title><description>To provide an antibacterial agent-blended silica dispersion having an antibacterial properties, scarce in reduction of a polishing speed even when used as one constituent of a polishing agent composition, and good in surface conditions of a board after polishing.SOLUTION: The silica dispersion contains colloidal silica, and an organic compound having a hemiformal structure. The organic compound having a hemiformal structure may be an aliphatic organic compound, an aromatic organic compound, or further a compound formed by combining an aliphatic organic compound with an aromatic organic compound.SELECTED DRAWING: None
【課題】抗菌性を有し、研磨剤組成物の一成分として使用する場合であっても、研磨速度の低下が僅かであり、研磨後の基板の表面状態が良好な抗菌剤を配合したシリカ分散液の提供を課題とする。【解決手段】シリカ分散液は、コロイダルシリカと、ヘミホルマール構造を有する有機化合物とを含有する。ヘミホルマール構造を有する有機化合物は、脂肪族有機化合物または芳香族有機化合物であってもよく、更に、脂肪族有機化合物と芳香族有機化合物とを組み合わせて形成されるものであっても構わない。【選択図】なし</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>INORGANIC CHEMISTRY</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAK9vTxdHZUcPEMDnANCvb099NRcPRzUQjw9_EM9vD0c1dwdHf1C1Fw9vcN8A_2DAEq4GFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGRgZm5hYGBo7GRCkCAMYjJ0c</recordid><startdate>20220509</startdate><enddate>20220509</enddate><creator>HARAGUCHI TETSURO</creator><scope>EVB</scope></search><sort><creationdate>20220509</creationdate><title>SILICA DISPERSION, AND POLISHING AGENT COMPOSITION</title><author>HARAGUCHI TETSURO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022067800A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>INORGANIC CHEMISTRY</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HARAGUCHI TETSURO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HARAGUCHI TETSURO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SILICA DISPERSION, AND POLISHING AGENT COMPOSITION</title><date>2022-05-09</date><risdate>2022</risdate><abstract>To provide an antibacterial agent-blended silica dispersion having an antibacterial properties, scarce in reduction of a polishing speed even when used as one constituent of a polishing agent composition, and good in surface conditions of a board after polishing.SOLUTION: The silica dispersion contains colloidal silica, and an organic compound having a hemiformal structure. The organic compound having a hemiformal structure may be an aliphatic organic compound, an aromatic organic compound, or further a compound formed by combining an aliphatic organic compound with an aromatic organic compound.SELECTED DRAWING: None
【課題】抗菌性を有し、研磨剤組成物の一成分として使用する場合であっても、研磨速度の低下が僅かであり、研磨後の基板の表面状態が良好な抗菌剤を配合したシリカ分散液の提供を課題とする。【解決手段】シリカ分散液は、コロイダルシリカと、ヘミホルマール構造を有する有機化合物とを含有する。ヘミホルマール構造を有する有機化合物は、脂肪族有機化合物または芳香族有機化合物であってもよく、更に、脂肪族有機化合物と芳香族有機化合物とを組み合わせて形成されるものであっても構わない。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMISTRY COMPOUNDS THEREOF DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INORGANIC CHEMISTRY MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-METALLIC ELEMENTS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING |
| title | SILICA DISPERSION, AND POLISHING AGENT COMPOSITION |
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