TRANSFER BASE MATERIAL REGENERATION APPARATUS AND TRANSFER BASE MATERIAL REGENERATION METHOD

To surely remove impurities remaining in a transfer base material.SOLUTION: A transfer base material regeneration apparatus 100 includes: a first pass line 1 which unwinds a long belt-like transfer base material 10 wound into a roll shape and conveys the transfer base material; a second pass line 2...

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Bibliographische Detailangaben
Hauptverfasser: ISHIZU SEIJI, TAKAKUWA YOSHIHISA
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To surely remove impurities remaining in a transfer base material.SOLUTION: A transfer base material regeneration apparatus 100 includes: a first pass line 1 which unwinds a long belt-like transfer base material 10 wound into a roll shape and conveys the transfer base material; a second pass line 2 which unwinds a long belt-like adhesive film 20 wound into a roll shape and conveys the adhesive film; a control part for controlling conveyance of the transfer base material 10; a first removal part 3 which is provided on the first pass line 1, brings the adhesive film 20 into contact with the transfer base material 10, and transfers impurities on the transfer base material 10 onto the adhesive film 20 and removes the impurities; an inspection part 4 which is provided on a downstream side of the first removal part 3 in the first pass line 1, and inspects a surface of the transfer base material 10; and a second removal part 30 which is provided in the first pass line 1 and removes the remaining impurities detected by the inspection part 4.SELECTED DRAWING: Figure 1 【課題】転写基材に残存する不純物を確実に除去する。【解決手段】実施形態に係る転写基材再生装置100は、ロール状に巻回された長尺帯状の転写基材10を巻出して、搬送する第1パスライン1と、ロール状に巻回された長尺帯状の粘着フィルム20を巻出して、搬送する第2パスライン2と、転写基材10の搬送を制御する制御部と、第1パスライン1に設けられ、転写基材10に粘着フィルム20を接触させて、転写基材10上の不純物を粘着フィルム20に転写して除去する第1除去部3と、第1パスライン1において、第1除去部3の下流に設けられ、転写基材10の表面を検査する検査部4と、第1パスライン1に設けられ、検査部4により検出された残存不純物を除去する第2除去部30とを備える転写基材再生装置。【選択図】図1