POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILM

To provide a polishing liquid composition for silicon oxide film that can achieve both improvement of polishing speed of silicon oxide film and reduction of line width dependence of polishing speed in concavo-convex pattern.SOLUTION: The present disclosure relates, in one aspect, to a polishing liquid composition for silicon oxide film that contains a cerium oxide particle (component A), a compound represented by the following formula (I) or formula (II) (component B), a nitrogen-containing heteroaromatic compound (component C) in which at least one hydrogen atom is substituted with a hydroxyl group, and an aqueous medium.SELECTED DRAWING: None 【課題】一態様において、酸化珪素膜の研磨速度の向上と、凹凸パターンにおける研磨速度の線幅依存性の低減とを両立可能な酸化珪素膜用研磨液組成物を提供する。【解決手段】本開示は、一態様において、酸化セリウム粒子（成分Ａ）と、下記式（Ｉ）又は式（ＩＩ）で表される化合物（成分Ｂ）と、少なくとも１つの水素原子がヒドロキシル基で置換された窒素含有複素芳香族化合物（成分Ｃ）と、水系媒体と、を含有する、酸化珪素膜用研磨液組成物に関する。JPEG2022061016000006.jpg37170【選択図】なし