POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILM

To provide, in one aspect, a polishing liquid composition which can achieve both increase in the polishing speed of a silicon oxide film and increase in the storage stability.SOLUTION: In one aspect, a polishing liquid composition for a silicon oxide film contains cerium oxide particles (component A...

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Bibliographische Detailangaben
Hauptverfasser:	INOUE MASAKI, YAMAGUCHI TETSUSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide, in one aspect, a polishing liquid composition which can achieve both increase in the polishing speed of a silicon oxide film and increase in the storage stability.SOLUTION: In one aspect, a polishing liquid composition for a silicon oxide film contains cerium oxide particles (component A), a compound represented by the formula (I) in the figure (component B), and an aqueous medium.SELECTED DRAWING: None 【課題】一態様において、酸化珪素膜の研磨速度の向上と保存安定性の向上とを両立可能な研磨液組成物を提供する。【解決手段】本開示は、一態様において、酸化セリウム粒子（成分Ａ）と、下記式（Ｉ）で表される化合物（成分Ｂ）と、水系媒体と、を含有する、酸化珪素膜用研磨液組成物に関する。JPEG2022060878000006.jpg26170【選択図】なし