SEMICONDUCTOR MANUFACTURING DEVICE, MEASURING DEVICE AND SEMICONDUCTOR MANUFACTURING METHOD

To provide, as technology capable of processing a wafer as predetermined and also inspecting a state of the wafer processed as predetermined, a semiconductor manufacturing device that is higher in convenience than before and can be embodied with relatively simple constitution.SOLUTION: A semiconductor manufacturing device comprises: a processing device which processes a wafer in a processing chamber as predetermined; a housing which forms a carrying chamber; a carrying mechanism which is arranged in the carrying chamber, and carries the wafer; a plurality of load ports which are fitted to the housing forming the carrying chamber; a carrying container which is fitted at least one of the plurality of load ports detachably in an airtight state; and a measuring device 25 which comprises a measuring instrument 35 arranged in a measurement chamber 26a, is fitted to a load port 10d different from the load port fitted with the carrying container detachably in an airtight state, and measures a state of the wafer having been processed as predetermined. The carrying mechanism carries the wafer, carried out from the carrying container, into the processing chamber, carries out the wafer processed as predetermined from the processing chamber, and carries it into the measurement chamber 26a.SELECTED DRAWING: Figure 12 【課題】ウェハに所定の処理を施すとともに所定の処理が施されたウェハの状態を検査できる技術であって、従来よりも利便性に優れ、比較的単純な構成で実現可能な半導体製造装置を提供する。【解決手段】処理室内でウェハに所定の処理を施す処理装置と、搬送室を形成する筐体と、搬送室内に配置され、ウェハを搬送する搬送機構と、搬送室を形成する筐体に取り付けられた複数のロードポートと、複数のロードポートのうちの少なくとも一つに着脱自在に気密状に取り付けられる搬送容器と、測定室２６ａ内に配置された測定器３５を備え、搬送容器が取り付けられるロードポートとは異なるロードポート１０ｄに着脱自在に気密状に取り付けられ、所定の処理が施されたウェハの状態を測定する測定装置２５とを備え、搬送機構は、搬送容器から搬出したウェハを処理室内に搬入し、所定の処理が施されたウェハを処理室から搬出して測定室２６ａ内に搬入する。【選択図】図１２