TEMPLATE, METHOD OF MANUFACTURING TEMPLATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

To provide a template such that a metal film formed on a bottom face of a groove of an alignment pattern is reducible in film thickness, and a method of manufacturing the template.SOLUTION: A template 1 comprises: a substrate which has a principal surface 12; a mesa structure 13 which is provided on...

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Bibliographische Detailangaben
1. Verfasser:	KOMUKAI TOSHIAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	To provide a template such that a metal film formed on a bottom face of a groove of an alignment pattern is reducible in film thickness, and a method of manufacturing the template.SOLUTION: A template 1 comprises: a substrate which has a principal surface 12; a mesa structure 13 which is provided on the principal surface, and has a first surface; and a silicone film 15 which is provided on a first surface of the mesa structure 13 and has unevenness patterns 16, 17, the silicon film being different in material from the substrate.SELECTED DRAWING: Figure 2 【課題】アライメントパターンの溝の底面に形成される金属膜の膜厚を厚くすることが可能なテンプレートおよびテンプレートの製造方法を提供する。【解決手段】テンプレート１は、主面１２を有する基材と、前記主面の上に設けられ、第１の面を有するメサ構造１３と、前記メサ構造１３の前記第１の面の上に設けられた、凹凸パターン１６，１７を有し、前記基材と材料が異なるシリコン膜１５とを備える。【選択図】図２