Fe-Pt-BN-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME

To solve a problem of particle generation in an Fe-Pt-BN-based sputtering target having a high relative density.SOLUTION: This Fe-Pt-BN-based sputtering target contains a non-magnetic component formed of BN and boron oxide or boron oxide and BN as well as carbon (C), has a relative density of 88% or...

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Hauptverfasser:	YAMAMOTO TAKAMITSU, WATANABE YASUNOBU, KOBAYASHI HIRONORI, MATSUDA TOMOKO, KUROSE KENTA, NISHIURA MASAHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ALLOYS ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY PHYSICS REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	To solve a problem of particle generation in an Fe-Pt-BN-based sputtering target having a high relative density.SOLUTION: This Fe-Pt-BN-based sputtering target contains a non-magnetic component formed of BN and boron oxide or boron oxide and BN as well as carbon (C), has a relative density of 88% or more, and an oxygen content of more than 4000 wtppm to 10,000 wtppm or less. The ratio of a water-soluble boron concentration (wt%) to the total boron concentration (wt%) as determined by a specific procedure is 1.0% or more.SELECTED DRAWING: Figure 1 【課題】高い相対密度を有するＦｅ－Ｐｔ－ＢＮ系スパッタリングターゲットのパーティクル発生の問題を解決する。【解決手段】ＢＮおよびホウ素酸化物からなる非磁性成分又はＢＮおよびホウ素酸化物並びに炭素（Ｃ）を含み、相対密度が８８％以上であり、酸素含有量が４０００ｗｔｐｐｍを超え１０，０００ｗｔｐｐｍ以下であり、特定の手順で求めた全ホウ素濃度（ｗｔ％）に対する水溶性ホウ素濃度（ｗｔ％）の割合が１．０％以上であることを特徴とする、Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット。【選択図】図１