METHOD AND DEVICE FOR EVALUATING JOINT LAYER
To solve an issue that there is no quantitatively evaluating a joint layer.SOLUTION: In an SiC substrate 106, a thin film heater 117a, b made of Ni-P is formed between a terminal electrode 115a and a terminal electrode 115b, a temperature probe 116 made of Ni-P is formed between a terminal electrode...
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Zusammenfassung: | To solve an issue that there is no quantitatively evaluating a joint layer.SOLUTION: In an SiC substrate 106, a thin film heater 117a, b made of Ni-P is formed between a terminal electrode 115a and a terminal electrode 115b, a temperature probe 116 made of Ni-P is formed between a terminal electrode 114a and a terminal electrode 114b, and a current application route is formed between a terminal electrode 124a and a terminal electrode 124b. The SiC substrate 106 and a copper plate 104 are connected with a sinter Ag paste 125. In the terminal electrodes, a constant current 128d is supplied from a TM direct current power source device to the thin film heater 117. The current application route receives the constant current 128a from an EM direct current power source device 803c.SELECTED DRAWING: Figure 36
【課題】接合層を定量的に評価できないという課題があった。【解決手段】SiC基板106に、端子電極115a、端子電極115b間にNi-Pからなる薄膜ヒータ117a,b、端子電極114a、端子電極114b間にNi-Pからなる温度プローブ116、端子電極124a、端子電極124b間に電流印加経路が形成される。SiC基板106と銅プレート104とは焼結Agペースト125で接続されている。端子電極には、TM用直流電源装置から定電流128dが、薄膜ヒータ117に供給される。電流印加経路には、EM用直流電源装置803cから定電流128aが供給される。【選択図】図36 |
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