LIGHT IRRADIATION METHOD, APPARATUS FOR ATTACHING LIGHT ABSORBING MATERIAL, FLYING BODY GENERATING METHOD AND APPARATUS, IMAGE FORMING METHOD, AND THREE-DIMENSIONAL OBJECT PRODUCING METHOD
To provide a light irradiation method with excellent landing position accuracy, and a flying body generating method.SOLUTION: There is provided a light irradiation method using a light absorbing material, for irradiating the light absorbing material with a light beam having a wavelength absorbable b...
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Zusammenfassung: | To provide a light irradiation method with excellent landing position accuracy, and a flying body generating method.SOLUTION: There is provided a light irradiation method using a light absorbing material, for irradiating the light absorbing material with a light beam having a wavelength absorbable by the light absorbing material. The method applies an energy that enables light absorbing material to fly by a pressure in a vaporized region with the pressure higher than or equal to outside pressure, in which vaporized region is present at an interface between a transparent body and the light absorbing material in a manner to surround an optical axis. There is also provided a flying body generating method including irradiating a surface of a base material on a side opposite to a side on which the light absorbing material is placed in the base material on which the light absorbing material is placed with a laser beam to fly the light absorbing material in an irradiation direction of the laser beam, in which the vaporized region having pressure higher than or equal to outside pressure is generated along the outer periphery of a region irradiated with the laser beam at the interface between the base material and the light absorbing material.SELECTED DRAWING: Figure 1A
【課題】着弾位置精度に優れる光照射方法及び飛翔体発生方法の提供。【解決手段】光を吸収する光吸収材と、前記光吸収材が吸収させる波長を有する光ビームを前記光吸収材に照射する方法であって、光軸を取り囲むように、透明体と光吸収材の界面に外気圧以上の気化領域を有し、その圧力で光吸収材に対して、飛翔可能なエネルギーを与える光照射方法である。また、光吸収材を表面に配した基材における、前記光吸収材が配された側とは反対側の前記基材の表面にレーザビームを照射することにより、前記レーザビームの照射方向に前記光吸収材を飛翔させる光吸収材飛翔工程を含み、前記基材と前記光吸収材との界面において、前記レーザビームが照射された領域における外周部に外気圧以上の気化領域を発生させる飛翔体発生方法である。【選択図】図1A |
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