PHOTORESISTS AND METHODS FOR USE THEREOF

To provide photoresists that can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces and methods for use thereof.SOLUTION: A method for providing an ion-implanted semiconductor substrate comprises: providing a semiconductor...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	GERHARD POHLERS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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