SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD FOR GENERATING DATA FOR LEARNING, LEARNING METHOD, LEARNING DEVICE, METHOD FOR CREATING LEARNED MODEL, AND LEARNED MODEL

To appropriately remove a resist layer having a hardened layer of a substrate to be processed.SOLUTION: A substrate processing apparatus (100) comprises a substrate holding unit (120), a chemical liquid supply unit (130), a substrate information acquisition unit (22a), a chemical liquid processing c...

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Hauptverfasser: ANO SEIJI, KOJIMARU TOMONORI
Format: Patent
Sprache:eng ; jpn
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