ABRASION FILM OF LOW FRICTION, AND PRODUCTION METHOD THEREOF
To provide an abrasion film of low friction having high alkali resistance.SOLUTION: An abrasion film of low friction 10 comprises a Cr layer 11 formed on the surface of a metal substrate, a WC layer 14 composed of a Cr-WC gradient layer 12 that is formed on the surface of the Cr layer 11, contains C...
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Zusammenfassung: | To provide an abrasion film of low friction having high alkali resistance.SOLUTION: An abrasion film of low friction 10 comprises a Cr layer 11 formed on the surface of a metal substrate, a WC layer 14 composed of a Cr-WC gradient layer 12 that is formed on the surface of the Cr layer 11, contains Cr and WC, and has a gradient composition that decreases a composition ratio of Cr and increases a composition ratio of WC as separating from the Cr layer 11 in the thickness direction and a WC uniform layer 13 made of WC and formed on the surface of the Cr-WC gradient layer 12, wherein the WC layer 14 has no W concentrated layer having a W simple substance in the boundary between the Cr-WC gradient layer 12 and the WC uniform layer 13, and a DLC layer 15, which is a top layer formed on the surface of the WC layer 14.SELECTED DRAWING: Figure 1
【課題】 耐アルカリ性が高められた低摩擦摩耗膜を提供すること。【解決手段】 低摩擦摩耗膜10は、金属基材表面に形成されたCr層11と、Cr層11の表面上に形成され、Cr及びWCを含み、Cr層11から厚み方向に離れるに従いCrの組成比率が減少し且つWCの組成比率が増加する傾斜組成を有するCr−WC傾斜層12及びCr−WC傾斜層12の表面上に形成されたWCからなるWC均一層13とを有し、Cr−WC層12とWC均一層13との境界にW単体が存在するW濃化層が形成されていないWC層14と、WC層14の表面上に形成されたトップ層としてのDLC層15と、を備える。【選択図】 図1 |
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