SURFACE PROCESSING DEVICE AND SURFACE PROCESSING METHOD

To provide a surface processing device whose cost can be suppressed while improving processing efficiency and a surface processing method.SOLUTION: A surface processing device 1 according to the present invention comprises: a beam irradiation unit 3 that irradiates some range on a surface of a work-...

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Bibliographische Detailangaben
Hauptverfasser: NAGAHAMA TAKAYA, MIZOGUCHI TAKASHI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a surface processing device whose cost can be suppressed while improving processing efficiency and a surface processing method.SOLUTION: A surface processing device 1 according to the present invention comprises: a beam irradiation unit 3 that irradiates some range on a surface of a work-piece W with a beam so as to form a fragile part which is lower in toughness than a base material of the work-piece W, and leaves a non-fragile part as the base material of the work-piece in a range not irradiated with the beam on the surface of the work-piece W; and a grinding unit 4 that grinds and removes the fragile part while leaving at least a portion of the non-fragile part on the surface of the work-piece W so as to form a functional surface having uneven shapes on the surface of the work-piece W.SELECTED DRAWING: Figure 3 【課題】加工能率を向上させつつ、装置コストを抑えることができる表面加工装置及び表面加工方法を提供する。【解決手段】本発明に係る表面加工装置1は、工作物Wの表面の一部範囲にビームを照射することにより工作物Wの基材よりも靭性の低い脆化部を形成し、工作物Wの表面においてビームが照射されていない範囲に工作物の基材としての非脆化部を残した状態とするビーム照射ユニット3と、工作物Wの表面において非脆化部の少なくとも一部を残して脆化部を研削除去することにより、工作物Wの表面に凹凸形状を有する機能性表面を形成する研削ユニット4とを備える。【選択図】図3