Al ALLOY VAPOR DEPOSITION FILM, WIRE FILM FOR DISPLAYS, DISPLAY DEVICE, AND SPUTTERING TARGET

To provide an Al alloy vapor deposition film having excellent bending resistance.SOLUTION: An Al alloy vapor deposition film according to one embodiment contains Al and other metal elements. The ratio of an electric resistivity after a bending test has been conducted 10,000 times to that before the...

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Bibliographische Detailangaben
Hauptverfasser:	OCHI MOTOTAKA, KURA CHIHARU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide an Al alloy vapor deposition film having excellent bending resistance.SOLUTION: An Al alloy vapor deposition film according to one embodiment contains Al and other metal elements. The ratio of an electric resistivity after a bending test has been conducted 10,000 times to that before the bending test is 1.1 or less. The ratio of an electric resistivity after a bending test has been conducted 100,000 times to that before the bending test is 1.3 or less.SELECTED DRAWING: Figure 1 【課題】本発明は、耐屈曲性に優れるＡｌ合金蒸着膜を提供することを目的とする。【解決手段】本発明の一態様に係るＡｌ合金蒸着膜は、Ａｌ及びＡｌ以外の他の金属元素を含み、屈曲試験を行う前の電気抵抗率に対する同試験を１万回行った後の電気抵抗率の比が１．１以下であり、かつ上記屈曲試験を行う前の電気抵抗率に対する同試験を１０万回行った後の電気抵抗率の比が１．３以下である。【選択図】図１