Al ALLOY VAPOR DEPOSITION FILM, WIRE FILM FOR DISPLAYS, DISPLAY DEVICE, SPUTTERING TARGET AND METHOD FOR PRODUCING Al ALLOY VAPOR DEPOSITION FILM

To provide an Al alloy vapor deposition film having excellent bending resistance.SOLUTION: An Al alloy vapor deposition film according to one embodiment contains Al crystal grains, and intermetallic compounds of Al and other metal elements. The Al crystal grains have an average particle size of 200...

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Hauptverfasser:	OCHI MOTOTAKA, KURA CHIHARU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADVERTISING BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYPTOGRAPHY DIFFUSION TREATMENT OF METALLIC MATERIAL DISPLAY DISPLAYING EDUCATION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LABELS OR NAME-PLATES METALLURGY PHYSICS SEALS SEMICONDUCTOR DEVICES SIGNS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide an Al alloy vapor deposition film having excellent bending resistance.SOLUTION: An Al alloy vapor deposition film according to one embodiment contains Al crystal grains, and intermetallic compounds of Al and other metal elements. The Al crystal grains have an average particle size of 200 nm or less. The ratio of an electric resistivity after a bending test has been conducted 100,000 times to that before the bending test is 1.6 or less.SELECTED DRAWING: Figure 1 【課題】本発明は、耐屈曲性に優れるＡｌ合金蒸着膜を提供することを目的とする。【解決手段】本発明の一態様に係るＡｌ合金蒸着膜は、Ａｌ結晶粒と、Ａｌ及び他の金属元素の金属間化合物とを含み、上記Ａｌ結晶粒の平均粒子径が２００ｎｍ以下であり、屈曲試験を行う前の電気抵抗率に対する同試験を１０万回行った後の電気抵抗率の比が１．６以下である。【選択図】図１