HIGH FREQUENCY GENERATION DEVICE

To provide a technique capable of reducing harmonics in a plasma generation device at a lower cost.SOLUTION: A high frequency generation device 2 hat reduces harmonics in the high-frequency power that is amplified by a high-frequency amplifier and supplied to a plasma generation electrode includes a...

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Bibliographische Detailangaben
1. Verfasser:	MURAI KOICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES DISINFECTION, STERILISATION, OR DEODORISATION OF AIR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY HUMAN NECESSITIES HYGIENE MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	To provide a technique capable of reducing harmonics in a plasma generation device at a lower cost.SOLUTION: A high frequency generation device 2 hat reduces harmonics in the high-frequency power that is amplified by a high-frequency amplifier and supplied to a plasma generation electrode includes a high-frequency generation unit 201 that generates a composite wave obtained by synthesizing a correction wave obtained by phasing the harmonics generated with respect to the input of a fundamental wave, and the fundamental wave.SELECTED DRAWING: Figure 3 【課題】プラズマ生成装置における高調波の低減をより低コストで行うことができる技術を提供する。【解決手段】高周波増幅器により増幅され、プラズマ生成電極に供給される高周波電力における高調波を低減させる高周波生成装置２であって、基本波の入力に対して生成される高調波を逆位相化した補正波と基本波とを合成した合成波を生成する高周波生成部２０１を備えた。【選択図】図３