SHOT PROCESSING DEVICE AND SHOT PROCESSING METHOD
To provide a shot processing device and a shot processing method capable of further improving the function for preventing shot materials from scattering.SOLUTION: A shot processing device comprises: projection mechanisms 4 for performing shot processing of a work-piece W; a cabinet 2 containing the...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a shot processing device and a shot processing method capable of further improving the function for preventing shot materials from scattering.SOLUTION: A shot processing device comprises: projection mechanisms 4 for performing shot processing of a work-piece W; a cabinet 2 containing the projection mechanisms 4; a height sensor 9 for detecting a height position of an upper surface of the work-piece W; a transfer mechanism 3 for transferring the work-piece W; a scattering prevention cover 2c for preventing shot materials from scattering from a transfer inlet provided in one side surface of the cabinet 2; a driving mechanism 7 for moving the scattering prevention cover 2c up and down; and a control unit 12 for controlling the driving mechanism 7. The control unit 12 sets a position of the scattering prevention cover 2c on the basis of an output of the height sensor 9.SELECTED DRAWING: Figure 1
【課題】ショット材の飛散防止機能をさらに向上させることができるショット処理装置およびショット処理方法を提供する。【解決手段】ワークWをショット処理する投射機構4、投射機構4が内包されるキャビネット2、ワークW上面の高さ位置を検知する高さセンサ9、ワークWを搬送する搬送機構3、キャビネット2の一側面に設けられた搬入口からのショット材の飛散を防止する飛散防止カバー2c、飛散防止カバー2cを上下動させる駆動機構7、駆動機構7を制御する制御部12、を備える。制御部12は、高さセンサ9の出力に基づいて飛散防止カバー2cの位置を設定する。【選択図】図1 |
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