SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To provide a semiconductor device capable of reproducibly reducing the contact resistance between a semiconductor substrate and an electrode with a simple configuration, and a method for manufacturing the semiconductor device.SOLUTION: It has a substrate into which impurities of a first conductivity...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HARAGUCHI MASAHIRO, KANEKO YUICHI, FURUTA KENICHI, KUROKI HIROKI, TERADA NOBUHIRO, INOUE TAKESHI, TSUJIMOTO MASAO
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!