METHOD OF DETECTING STATE OF PLASMA SOURCE AND PLASMA SOURCE

To provide a method capable of more accurately detecting the change of plasma from CCP to ICP, and a plasma source.SOLUTION: In a method of detecting the state of an inductively coupled plasma source, the plasma source includes a DC power supply circuit, an inverter circuit, a resonance circuit, and...

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Hauptverfasser:	NOTOMI HAYATO, AMADATE SHIGEKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a method capable of more accurately detecting the change of plasma from CCP to ICP, and a plasma source.SOLUTION: In a method of detecting the state of an inductively coupled plasma source, the plasma source includes a DC power supply circuit, an inverter circuit, a resonance circuit, and a discharge unit. The method includes: a step of generating a capacitively coupled plasma in the discharge portion; a step of acquiring a voltage and a current at an output end of the DC power supply circuit after the capacitively coupled plasma is generated; a step of acquiring a current increase rate representing the ratio of the increase of the current to the increase of the voltage; and a step of outputting a first signal according to the change of the current increase rate.SELECTED DRAWING: Figure 2 【課題】プラズマがＣＣＰからＩＣＰに変化したことをより正確に検出することができる方法およびプラズマ源を提供する。【解決手段】誘導結合型のプラズマ源の状態を検出する方法において、前記プラズマ源は、直流電源回路と、インバータ回路と、共振回路と、放電部とを備え、前記方法は、前記放電部において容量結合プラズマを発生させるステップと、前記容量結合プラズマが発生した後に、前記直流電源回路の出力端における電圧および電流を取得するステップと、前記電圧の増加分に対する前記電流の増加分の比率を表す電流増加率を取得するステップと、前記電流増加率の変化に応じて第１信号を出力するステップと、を備える。【選択図】図２