MOLECULAR LAYER DEPOSITION OF AMORPHOUS CARBON FILM

To provide a method for forming a carbon polymer film.SOLUTION: Several methods are executed advantageously at a lower temperature. A substrate forms a substrate surface having a terminal based on a reactive functional group of a first carbon precursor, by being exposed to the first carbon precursor...

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Bibliographische Detailangaben
Hauptverfasser: MARK SALY, ABHIJIT BASU MALLICK, BHASKAR JYOTI BHUYAN, EUGENE YU JIN KONG, QI BO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a method for forming a carbon polymer film.SOLUTION: Several methods are executed advantageously at a lower temperature. A substrate forms a substrate surface having a terminal based on a reactive functional group of a first carbon precursor, by being exposed to the first carbon precursor, and is reacted with the surface terminal and forms a carbon polymer film, by being exposed to a second carbon precursor. A treatment tool for executing process and a non-temporary memory are also disclosed.SELECTED DRAWING: Figure 1 【課題】炭素ポリマー膜を形成する方法を提供する。【解決手段】いくつかの方法は、有利には、より低い温度で実行される。基板は、第1の炭素前駆体に曝露されて、第1の炭素前駆体の反応性官能基に基づき末端を有する基板表面を形成し、かつ第2の炭素前駆体に曝露されて、表面末端と反応し、炭素ポリマー膜を形成する。プロセスを実行するための処理ツール及び非一時的なメモリもまた、開示される。【選択図】図1