LASER PROCESSING DEVICE AND METHOD FOR CONTROLLING LASER PROCESSING DEVICE

To provide a laser processing device that can reduce processing objects to be disposed due to processing failure.SOLUTION: A laser processing device (2) includes: an irradiation part (240); a receiving part (216) for receiving a processing pattern and an irradiation condition on a laser beam (W); an...

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Bibliographische Detailangaben
Hauptverfasser: SAKAMOTO TATSUNORI, YOKOI TADAMASA, TSUCHIMICHI KAZUMI, YOSHITAKE NAOKI, ASHIHARA KATSUMITSU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a laser processing device that can reduce processing objects to be disposed due to processing failure.SOLUTION: A laser processing device (2) includes: an irradiation part (240); a receiving part (216) for receiving a processing pattern and an irradiation condition on a laser beam (W); and a control unit (211) for controlling irradiation with the laser beam (W) on the basis of the processing pattern and the irradiation condition received by the receiving part (216) and irradiation condition. The control unit (211) performs first processing of processing at least part of a first processing region (P) of a processing object (8) into a reverse pattern in which an irradiation region with the laser beam (W) and a non-irradiation region with the laser beam (W) in the processing pattern are reversed.SELECTED DRAWING: Figure 6 【課題】加工の失敗により廃棄される加工対象物を減らすことができるレーザ加工装置を提供する。【解決手段】レーザ加工装置(2)は、照射部(240)と、加工パターンおよびレーザ光(W)の照射条件を受け付ける受付部(216)と、受付部(216)で受け付けた加工パターンおよび照射条件に基づいて、レーザ光(W)の照射を制御する制御部(211)とを備える。制御部(211)は、加工対象物(8)の第1加工領域(P)の少なくとも一部を、加工パターンのレーザ光(W)の照射領域とレーザ光(W)の非照射領域とを反転させた反転パターンに加工する第1処理を行う。【選択図】図6