SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To provide a technology that can suppress the generation of cutting debris and also suppress the reduction of dimensional accuracy of lead frames.SOLUTION: A semiconductor manufacturing apparatus 1 comprises a punch 6 having a tip 6a that cuts a tie bar portion 3 of a lead frame 2, a punch guide 8 t...

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Bibliographische Detailangaben
Hauptverfasser: ICHIKAWA KEITARO, SHIKASHO YUJI, KAWAHARA FUMIHITO
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a technology that can suppress the generation of cutting debris and also suppress the reduction of dimensional accuracy of lead frames.SOLUTION: A semiconductor manufacturing apparatus 1 comprises a punch 6 having a tip 6a that cuts a tie bar portion 3 of a lead frame 2, a punch guide 8 that supports the punch 6 so that it can be moved between a cutting start position and a cutting position that is located below the cutting start position, and a die 7 that has a recess 7a into which the tip 6a of the punch 6 is inserted in a state that the punch 6 is in the cutting position, and sandwiches and fixes the tie bar portion 3 with the punch guide 8. The tip 6a of the punch 6 is a convex shape that protrudes downward.SELECTED DRAWING: Figure 2 【課題】切断屑の発生を抑制し、かつ、リードフレームの寸法精度の低下を抑制できる技術を提供することを目的とする。【解決手段】半導体製造装置1は、リードフレーム2のタイバー部3を切断する先端部6aを有するパンチ6と、切断開始位置と切断開始位置よりも下方に位置する切断位置との間で移動可能なようにパンチ6を支持するパンチガイド8と、パンチ6が切断位置にある状態でパンチ6の先端部6aが挿入される凹部7aを有し、パンチガイド8とでタイバー部3を挟んで固定するダイ7とを備え、パンチ6の先端部6aは下方に突出する凸形状である。【選択図】図2