POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED FILM, AND METHOD FOR PRODUCING THE SAME

To provide a positive photosensitive resin composition which hardly causes tackiness in the positive photosensitive resin composition and gives a cured film excellent in reworkability.SOLUTION: The positive photosensitive resin composition contains a component (A): a compound whose alkali solubility...

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Hauptverfasser: INENARI HIROSHI, FUJIMOTO KOHEI, SAITO ARIHIRO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a positive photosensitive resin composition which hardly causes tackiness in the positive photosensitive resin composition and gives a cured film excellent in reworkability.SOLUTION: The positive photosensitive resin composition contains a component (A): a compound whose alkali solubility increases by the action of an acid, a component (B): a photoacid generator, and a component (C): a copolymer which is composed of two or more monomers selected from the group consisting of (meth)acrylic acid, a (meth)acrylate, styrene, a styrene derivative, and maleic anhydride, provided that at least one of (meth)acrylic acid and maleic anhydride is an essential component. The content of the component (C) is 1-10 pts.wt. based on 100 pts.wt. of the component (A).SELECTED DRAWING: None 【課題】ポジ型感光性樹脂組成物においてタックが発生しにくく、且つリワーク性に優れた硬化膜を与えるポジ型感光性樹脂組成物を提供する。【解決手段】(A)成分:酸の作用によりアルカリ溶解性が増大する化合物; (B)成分:光酸発生剤; (C)成分:(メタ)アクリル酸、(メタ)アクリル酸エステル、スチレン、スチレン誘導体、マレイン酸無水物の群から選択される少なくとも2つ以上のモノマーから構成される共重合体であって、(メタ)アクリル酸又はマレイン酸無水物の少なくとも一方が必須成分である共重合体;を含有し、(A)成分100重量部に対する前記(C)成分の含有量が1〜10重量部であるポジ型感光性樹脂組成物。【選択図】なし