APPARATUS FOR MANUFACTURING VAPOR DEPOSITION FILM

To provide an apparatus for manufacturing a vapor deposition film, capable of stably and sufficiently obtaining adhesion between a long-sized polymer film and a thin film even when continuously treated for a long time when subjecting the long-sized polymer film to surface treatment by ion beam irradiation to deposit the thin film.SOLUTION: In an apparatus for manufacturing a vapor deposition film, where a long-sized polymer film 2 is conveyed in a vacuum vessel 1 and the surface of the long-sized polymer film is irradiated with an ion beam 6 generated by an ion beam generating electrode 7 to form a thin film on the surface of the long-sized polymer film by a thin film deposition mechanism 13, an electronic generator 12 is arranged in the vicinity of the ion beam generating electrode. When setting a pressure in a region where the surface of the long-sized polymer film is irradiated with the ion beam to P (Pa) and setting a distance between the ion beam irradiation opening of the ion beam generating electrode and the electron irradiation opening of the electronic generator to A (mm), the formula (1) is satisfied. 10≤A≤50/P...(1).SELECTED DRAWING: Figure 1 【課題】高分子長尺フィルムにイオンビーム照射による表面処理をしたのち薄膜を形成する場合、長時間連続で処理しても、高分子長尺フィルムと薄膜の密着性を安定して十分に得ることができる、蒸着フィルムの製造装置を提供する。【解決手段】真空容器１内で、高分子長尺フィルム２を搬送させ、イオンビーム発生電極７により発生させたイオンビーム６を、高分子長尺フィルムの表面に照射したのち、薄膜形成機構１３により前記高分子長尺フィルムの表面に薄膜を形成させる蒸着フィルムの製造装置において、電子発生装置１２が前記イオンビーム発生電極の近傍に配設され、前記高分子長尺フィルムの表面にイオンビームが照射される領域の圧力をＰ（Ｐａ）とし、前記イオンビーム発生電極のイオンビーム照射口と前記電子発生装置の電子照射口の距離をＡ（ｍｍ）としたとき、式（１）を満足する蒸着フィルムの製造装置。１０≦Ａ≦５０/Ｐ・・・（１）【選択図】図１