SUBSTRATE HOLDER AND FILM DEPOSITION APPARATUS

To suppress a variation in thickness of a film formed on a distorted substrate.SOLUTION: A substrate holder is arranged on a side part of a rotation drum mechanism rotating around a center axis. A part of the substrate holder is distorted so as to protrude toward the center axis. A holding region surface for the substrate holder to hold a substrate and a region surface other than the holding region surface are constituted with a continuous surface. When two of the substrate holder are arranged in parallel on the side part in a rotation direction where the rotation drum mechanism rotates, a first edge part which is in a middle part of both edge parts of one substrate holder and is positioned in a side part of the other substrate holder is arranged in parallel so as to be aligned to a second edge part which is in a middle of both edge parts of the other substrate holder and is positioned in a side of the other substrate holder.SELECTED DRAWING: Figure 1 【課題】歪曲された基板に形成される膜の厚みのばらつきを抑制する。【解決手段】基板ホルダは、中心軸を中心に回転する回転ドラム機構の側部に設置される。上記基板ホルダの少なくとも一部は、上記中心軸に向かって突き出るように歪曲する。上記基板ホルダが基板を保持する保持領域面と、上記保持領域面外の領域面とが連続面で構成される。上記回転ドラム機構が回転する回転方向において、上記側部に２つの上記基板ホルダが並設されたとき、一方の基板ホルダの両端部の中、他方の基板ホルダの側に位置する第１端部が他方の基板ホルダの両端部の中、上記一方の基板ホルダの側に位置する第２端部に沿うように並設される。【選択図】図１