SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM AND RECORD MEDIUM
To provide a technology that can improve the throughput of substrate processing.SOLUTION: A technology is provided having a processing unit that processes substrates, a transmitting/receiving unit that is communicatively connected to a group management device and transmits/receives only telegram dat...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a technology that can improve the throughput of substrate processing.SOLUTION: A technology is provided having a processing unit that processes substrates, a transmitting/receiving unit that is communicatively connected to a group management device and transmits/receives only telegram data to/from the group management device, and a control unit that controls processing performed by the processing unit based on the telegram data received by the transmitting/receiving unit.SELECTED DRAWING: Figure 1
【課題】基板処理のスループット向上が図れる技術を提供する。【解決手段】基板を処理する処理部と、群管理装置と通信可能に接続し、群管理装置との間で電文データのみを送受信する送受信部と、送受信部が受信した電文データに基づいて処理部で行う処理を制御する制御部と、を有する技術が提供される。【選択図】図1 |
---|